Oak Ridge National Laboratory


News Release

Media Contact: Fred Strohl (strohlhf@ornl.gov)
Communications and External Relations


ORNL's Sikka receives Certificate of Environmental Achievement

OAK RIDGE, Tenn., April 3, 1997 — Vinod Sikka of the Department of Energy's (DOE) Oak Ridge National Laboratory (ORNL) has been selected as a recipient of a Certificate of Environmental Achievement and will appear in Renew America's 1997 Environmental Success Index.

Sikka was chosen for inclusion because of his work on the Exo-Melt Process for melting nickel aluminides.

The publication contains information on nearly 1,600 outstanding environmental programs from around the country. It provides replicable examples of effective environmental solutions to government agencies, companies, environmental organizations and civic groups seeking to improve their communities.

Before being included in the index, programs undergo a rigorous verification process, including community references, review by state and local authorities and careful screening by the National Awards Council for Environmental Sustainability.

Sikka joined ORNL in 1974 and has been a Materials Processing group leader in the Metals and Ceramics Division since 1986.

He holds a bachelor's degree in chemistry from the University of Delhi in Delhi, India, and another bachelor's degree in metallurgical engineering from the Indian Institute of Science in Bangalore, India. Later, he earned a master's and doctorate in metallurgical engineering, both from the University of Cincinnati.

Sikka's work has been featured in more than 150 open-literature publications. He has been granted eight patents and has received five R&D 100 Awards.

He is active in several professional societies, including the American Society for Metals and the Materials Research Society.

Sikka, and his wife, Veena, live in Oak Ridge. They have two children: Neal and Monica.

ORNL, one of DOE's multiprogram national research and development facilities, is managed by Lockheed Martin Energy Research Corporation.