Chemical Vapor Deposition

A variable-pressure CVD setup is used to grow nanotubes by chemical vapor deposition. The 3"-i.d. tube furnace operates at up to 1200 °C. A downstream throttle valve permits gas pressures to be regulated at low pressures (~ 1 Torr) if desired. Electropneumatic valves permit rapid switching of growth gases. Optical viewports permit the entry and exit of laser beams for spectroscopic diagnostic measurements.

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